Nanostructured plasma etched, magnetron sputtered nanolaminar Cr 2 AlC MAX phase thin films

Rolf Grieseler, Bernd Hähnlein, Mike Stubenrauch, Thomas Kups, Marcus Wilke, Marcus Hopfeld, Jörg Pezoldt, Peter Schaaf

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

32 Citas (Scopus)

Resumen

The knowledge of the mechanical properties of new materials determines essentially their usability and functionality when used in micro- and nanostructures. MAX phases are new and highly interesting materials due to their unique combination of materials properties. In this article a new method for producing the Cr 2 AlC MAX phase is presented. Thin film elemental multilayer deposition and subsequent rapid thermal annealing forms the MAX phase within seconds. Additionally, free standing microstructures (beams and cantilevers) based on this MAX phase films are prepared by plasma etching. The mechanical properties of these MAX phase microstructures are investigated.

Idioma originalInglés
Páginas (desde-hasta)997-1001
Número de páginas5
PublicaciónApplied Surface Science
Volumen292
DOI
EstadoPublicada - 15 feb. 2014
Publicado de forma externa

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