Formation of Ti ₂AlN nanolaminate films by multilayer-deposition and subsequent rapid thermal annealing

Multilayers consisting of titanium layers with a thickness of 4.5 nm and aluminum nitride layers with a thickness of 3 nm were deposited onto Si/Si ₃N ₄ substrates. Subsequently, the multilayer systems were annealed by a rapid thermal annealing process. This way, thin films of almost pure M _{n + 1}AX _n-phase Ti ₂AlN could be produced, as confirmed by X-ray diffraction, glow discharge optical emission spectroscopy and high-resolution transmission electron microscopy. This procedure has a high potential for the preparation of MAX phase coatings.