Determining the virtual surface in the thermal evaporation process of magnesium fluoride from a tungsten boat for different deposition rates, to be used in precision optical components

Vacuum thermal evaporation has, for some time now, been the principal method for the deposition of thin films, given, among other aspects, its simplicity, flexibility, and relatively low cost. Therefore, the development of models attempting to predict the deposition patterns of given thin film materials in different locations of a vacuum evaporation chamber are arguably important. With this in mind, we have designed one of such models for the thermal evaporation process of magnesium fluoride (MgF2), a common material used in optical thin films, originating from a tungsten boat source. For this we took several deposition samples in glass slide substrates at different locations in the vacuum chamber, considering as independent variables the mean deposition rate, and the axial and vertical distances of the source to the substrate. After a careful analysis by matrix method from the spectral transmittance data of the samples, while providing as output data the spectral transmittance, as well as the physical thickness of the films, both as functions of the aforementioned variables, the virtual surface of the source was determined.