Titanium dioxide thin films: Refractive index variation as a function of the deposition rate

G. Gálvez; G. Baldwin; F. Villa

doi:10.1117/12.590925

Titanium dioxide thin films: Refractive index variation as a function of the deposition rate

G. Gálvez, G. Baldwin, F. Villa

Sección de Física

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

The present work studies the variation of refractive index of titanium dioxide thin films due to changes in the evaporation rate during the deposition process under high vacuum. The experiments were done by depositing thin films on a glass disk of 45 cm in diameter for different deposition rates. To characterize thin films the spectral transmittance in the visible range was measured at different points along of two perpendicular radii. The refractive index profile was then determined from these data by using an inverse synthesis method. The results permitted us to obtain the refractive index variation as a function of evaporation geometry for different deposition rates.

Original language	English
Article number	107
Pages (from-to)	560-563
Number of pages	4
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5622
Issue number	PART 2
DOIs	https://doi.org/10.1117/12.590925
State	Published - 2004
Event	RIAO/OPTILAS 2004: 5th Iberoamerican Meeting on Optics, and 8th Latin American Meeting on Optics, Lasers, and their Applications; ICO Regional Meeting - Porlamar, Venezuela, Bolivarian Republic of Duration: 3 Oct 2004 → 8 Oct 2004

Keywords

Optical coatings
Optical properties
Reactive evaporation
Thin films

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10.1117/12.590925

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title = "Titanium dioxide thin films: Refractive index variation as a function of the deposition rate",

abstract = "The present work studies the variation of refractive index of titanium dioxide thin films due to changes in the evaporation rate during the deposition process under high vacuum. The experiments were done by depositing thin films on a glass disk of 45 cm in diameter for different deposition rates. To characterize thin films the spectral transmittance in the visible range was measured at different points along of two perpendicular radii. The refractive index profile was then determined from these data by using an inverse synthesis method. The results permitted us to obtain the refractive index variation as a function of evaporation geometry for different deposition rates.",

keywords = "Optical coatings, Optical properties, Reactive evaporation, Thin films",

author = "G. G{\'a}lvez and G. Baldwin and F. Villa",

year = "2004",

doi = "10.1117/12.590925",

language = "English",

volume = "5622",

pages = "560--563",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

number = "PART 2",

note = "RIAO/OPTILAS 2004: 5th Iberoamerican Meeting on Optics, and 8th Latin American Meeting on Optics, Lasers, and their Applications; ICO Regional Meeting ; Conference date: 03-10-2004 Through 08-10-2004",

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TY - JOUR

T1 - Titanium dioxide thin films

T2 - RIAO/OPTILAS 2004: 5th Iberoamerican Meeting on Optics, and 8th Latin American Meeting on Optics, Lasers, and their Applications; ICO Regional Meeting

AU - Gálvez, G.

AU - Baldwin, G.

AU - Villa, F.

PY - 2004

Y1 - 2004

N2 - The present work studies the variation of refractive index of titanium dioxide thin films due to changes in the evaporation rate during the deposition process under high vacuum. The experiments were done by depositing thin films on a glass disk of 45 cm in diameter for different deposition rates. To characterize thin films the spectral transmittance in the visible range was measured at different points along of two perpendicular radii. The refractive index profile was then determined from these data by using an inverse synthesis method. The results permitted us to obtain the refractive index variation as a function of evaporation geometry for different deposition rates.

AB - The present work studies the variation of refractive index of titanium dioxide thin films due to changes in the evaporation rate during the deposition process under high vacuum. The experiments were done by depositing thin films on a glass disk of 45 cm in diameter for different deposition rates. To characterize thin films the spectral transmittance in the visible range was measured at different points along of two perpendicular radii. The refractive index profile was then determined from these data by using an inverse synthesis method. The results permitted us to obtain the refractive index variation as a function of evaporation geometry for different deposition rates.

KW - Optical coatings

KW - Optical properties

KW - Reactive evaporation

KW - Thin films

UR - http://www.scopus.com/inward/record.url?scp=17644367469&partnerID=8YFLogxK

U2 - 10.1117/12.590925

DO - 10.1117/12.590925

M3 - Conference article

AN - SCOPUS:17644367469

SN - 0277-786X

VL - 5622

SP - 560

EP - 563

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

IS - PART 2

M1 - 107

Y2 - 3 October 2004 through 8 October 2004

ER -

Titanium dioxide thin films: Refractive index variation as a function of the deposition rate

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