Thermal activation and cathodoluminescence measurements of Tb 3+-doped a-(SiC)1-x(AlN)x thin films

O. Erlenbach, G. Gálvez, J. A. Guerra, F. De Zela, R. Weingärtner, A. Winnacker

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

We produce amorphous terbium doped wide bandgap semiconductor thin films of the pseudobinary compound (SiC)1-x(AlN)x by rf triple magnetron sputtering. Cathodoluminescence measurements performed at samples having different compositions x show pronounced intra 4f shell transition peaks of the trivalent terbium. Thermal activation of the terbium emission by isochronal annealing of the films leads to a strong increase in emission intensity.

Original languageEnglish
Title of host publicationSilicon Carbide and Related Materials 2009
Subtitle of host publicationICSCRM 2009
PublisherTrans Tech Publications Ltd
Pages459-462
Number of pages4
ISBN (Print)0878492798, 9780878492794
DOIs
StatePublished - 2010
Event13th International Conference on Silicon Carbide and Related Materials 2009, ICSCRM 2009 - Nurnberg, Germany
Duration: 11 Oct 200916 Oct 2009

Publication series

NameMaterials Science Forum
Volume645-648
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Conference

Conference13th International Conference on Silicon Carbide and Related Materials 2009, ICSCRM 2009
Country/TerritoryGermany
CityNurnberg
Period11/10/0916/10/09

Keywords

  • Aluminum nitride
  • Annealing
  • Bandgap engineering
  • Cathodoluminescence
  • Rare earths

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