Nanostructured plasma etched, magnetron sputtered nanolaminar Cr                          2                         AlC MAX phase thin films

Rolf Grieseler; Bernd Hähnlein; Mike Stubenrauch; Thomas Kups; Marcus Wilke; Marcus Hopfeld; Jörg Pezoldt; Peter Schaaf

doi:10.1016/j.apsusc.2013.12.099

Nanostructured plasma etched, magnetron sputtered nanolaminar Cr ₂ AlC MAX phase thin films

Rolf Grieseler
, Bernd Hähnlein
, Mike Stubenrauch
, Thomas Kups
, Marcus Wilke
, Marcus Hopfeld
, Jörg Pezoldt
, Peter Schaaf

Technical University of Ilmenau

Research output: Contribution to journal › Article › peer-review

44 Scopus citations

Abstract

The knowledge of the mechanical properties of new materials determines essentially their usability and functionality when used in micro- and nanostructures. MAX phases are new and highly interesting materials due to their unique combination of materials properties. In this article a new method for producing the Cr ₂ AlC MAX phase is presented. Thin film elemental multilayer deposition and subsequent rapid thermal annealing forms the MAX phase within seconds. Additionally, free standing microstructures (beams and cantilevers) based on this MAX phase films are prepared by plasma etching. The mechanical properties of these MAX phase microstructures are investigated.

Original language	English
Pages (from-to)	997-1001
Number of pages	5
Journal	Applied Surface Science
Volume	292
DOIs	https://doi.org/10.1016/j.apsusc.2013.12.099
State	Published - 15 Feb 2014
Externally published	Yes

Keywords

MAX phase
MEMS
Mechanical properties
Multilayer
Rapid thermal annealing

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10.1016/j.apsusc.2013.12.099

Cite this

Grieseler, R., Hähnlein, B., Stubenrauch, M., Kups, T., Wilke, M., Hopfeld, M., Pezoldt, J., & Schaaf, P. (2014). Nanostructured plasma etched, magnetron sputtered nanolaminar Cr ₂ AlC MAX phase thin films Applied Surface Science, 292, 997-1001. https://doi.org/10.1016/j.apsusc.2013.12.099

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title = " Nanostructured plasma etched, magnetron sputtered nanolaminar Cr 2 AlC MAX phase thin films ",

abstract = " The knowledge of the mechanical properties of new materials determines essentially their usability and functionality when used in micro- and nanostructures. MAX phases are new and highly interesting materials due to their unique combination of materials properties. In this article a new method for producing the Cr 2 AlC MAX phase is presented. Thin film elemental multilayer deposition and subsequent rapid thermal annealing forms the MAX phase within seconds. Additionally, free standing microstructures (beams and cantilevers) based on this MAX phase films are prepared by plasma etching. The mechanical properties of these MAX phase microstructures are investigated.",

keywords = "MAX phase, MEMS, Mechanical properties, Multilayer, Rapid thermal annealing",

author = "Rolf Grieseler and Bernd H{\"a}hnlein and Mike Stubenrauch and Thomas Kups and Marcus Wilke and Marcus Hopfeld and J{\"o}rg Pezoldt and Peter Schaaf",

year = "2014",

month = feb,

day = "15",

doi = "10.1016/j.apsusc.2013.12.099",

language = "English",

volume = "292",

pages = "997--1001",

journal = "Applied Surface Science",

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}

Grieseler, R, Hähnlein, B, Stubenrauch, M, Kups, T, Wilke, M, Hopfeld, M, Pezoldt, J & Schaaf, P 2014, ' Nanostructured plasma etched, magnetron sputtered nanolaminar Cr ₂ AlC MAX phase thin films ', Applied Surface Science, vol. 292, pp. 997-1001. https://doi.org/10.1016/j.apsusc.2013.12.099

Nanostructured plasma etched, magnetron sputtered nanolaminar Cr ₂ AlC MAX phase thin films . / Grieseler, Rolf; Hähnlein, Bernd; Stubenrauch, Mike et al.
In: Applied Surface Science, Vol. 292, 15.02.2014, p. 997-1001.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Nanostructured plasma etched, magnetron sputtered nanolaminar Cr 2 AlC MAX phase thin films

AU - Grieseler, Rolf

AU - Hähnlein, Bernd

AU - Stubenrauch, Mike

AU - Kups, Thomas

AU - Wilke, Marcus

AU - Hopfeld, Marcus

AU - Pezoldt, Jörg

AU - Schaaf, Peter

PY - 2014/2/15

Y1 - 2014/2/15

N2 - The knowledge of the mechanical properties of new materials determines essentially their usability and functionality when used in micro- and nanostructures. MAX phases are new and highly interesting materials due to their unique combination of materials properties. In this article a new method for producing the Cr 2 AlC MAX phase is presented. Thin film elemental multilayer deposition and subsequent rapid thermal annealing forms the MAX phase within seconds. Additionally, free standing microstructures (beams and cantilevers) based on this MAX phase films are prepared by plasma etching. The mechanical properties of these MAX phase microstructures are investigated.

AB - The knowledge of the mechanical properties of new materials determines essentially their usability and functionality when used in micro- and nanostructures. MAX phases are new and highly interesting materials due to their unique combination of materials properties. In this article a new method for producing the Cr 2 AlC MAX phase is presented. Thin film elemental multilayer deposition and subsequent rapid thermal annealing forms the MAX phase within seconds. Additionally, free standing microstructures (beams and cantilevers) based on this MAX phase films are prepared by plasma etching. The mechanical properties of these MAX phase microstructures are investigated.

KW - MAX phase

KW - MEMS

KW - Mechanical properties

KW - Multilayer

KW - Rapid thermal annealing

UR - https://www.scopus.com/pages/publications/84893642870

U2 - 10.1016/j.apsusc.2013.12.099

DO - 10.1016/j.apsusc.2013.12.099

M3 - Article

AN - SCOPUS:84893642870

SN - 0169-4332

VL - 292

SP - 997

EP - 1001

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Nanostructured plasma etched, magnetron sputtered nanolaminar Cr ₂ AlC MAX phase thin films

Abstract

Keywords

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