Nanostructured plasma etched, magnetron sputtered nanolaminar Cr 2 AlC MAX phase thin films

Rolf Grieseler, Bernd Hähnlein, Mike Stubenrauch, Thomas Kups, Marcus Wilke, Marcus Hopfeld, Jörg Pezoldt, Peter Schaaf

Research output: Contribution to journalArticlepeer-review

39 Scopus citations

Abstract

The knowledge of the mechanical properties of new materials determines essentially their usability and functionality when used in micro- and nanostructures. MAX phases are new and highly interesting materials due to their unique combination of materials properties. In this article a new method for producing the Cr 2 AlC MAX phase is presented. Thin film elemental multilayer deposition and subsequent rapid thermal annealing forms the MAX phase within seconds. Additionally, free standing microstructures (beams and cantilevers) based on this MAX phase films are prepared by plasma etching. The mechanical properties of these MAX phase microstructures are investigated.

Original languageEnglish
Pages (from-to)997-1001
Number of pages5
JournalApplied Surface Science
Volume292
DOIs
StatePublished - 15 Feb 2014
Externally publishedYes

Keywords

  • MAX phase
  • MEMS
  • Mechanical properties
  • Multilayer
  • Rapid thermal annealing

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