Formation of Ti 2AlN nanolaminate films by multilayer-deposition and subsequent rapid thermal annealing

Rolf Grieseler; Thomas Kups; Marcus Wilke; Marcus Hopfeld; Peter Schaaf

doi:10.1016/j.matlet.2012.05.055

Formation of Ti ₂AlN nanolaminate films by multilayer-deposition and subsequent rapid thermal annealing

Rolf Grieseler, Thomas Kups, Marcus Wilke, Marcus Hopfeld, Peter Schaaf

Technical University of Ilmenau

Research output: Contribution to journal › Article › peer-review

35 Scopus citations

Abstract

Multilayers consisting of titanium layers with a thickness of 4.5 nm and aluminum nitride layers with a thickness of 3 nm were deposited onto Si/Si ₃N ₄ substrates. Subsequently, the multilayer systems were annealed by a rapid thermal annealing process. This way, thin films of almost pure M _{n + 1}AX _n-phase Ti ₂AlN could be produced, as confirmed by X-ray diffraction, glow discharge optical emission spectroscopy and high-resolution transmission electron microscopy. This procedure has a high potential for the preparation of MAX phase coatings.

Original language	English
Pages (from-to)	74-77
Number of pages	4
Journal	Materials Letters
Volume	82
DOIs	https://doi.org/10.1016/j.matlet.2012.05.055
State	Published - 1 Sep 2012
Externally published	Yes

Keywords

GDOES
GIXRD
HRTEM
MAX-phase
Multilayer coatings
Nanolaminates
RTA
Ti AlN

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10.1016/j.matlet.2012.05.055

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title = "Formation of Ti 2AlN nanolaminate films by multilayer-deposition and subsequent rapid thermal annealing",

abstract = "Multilayers consisting of titanium layers with a thickness of 4.5 nm and aluminum nitride layers with a thickness of 3 nm were deposited onto Si/Si 3N 4 substrates. Subsequently, the multilayer systems were annealed by a rapid thermal annealing process. This way, thin films of almost pure M n + 1AX n-phase Ti 2AlN could be produced, as confirmed by X-ray diffraction, glow discharge optical emission spectroscopy and high-resolution transmission electron microscopy. This procedure has a high potential for the preparation of MAX phase coatings.",

keywords = "GDOES, GIXRD, HRTEM, MAX-phase, Multilayer coatings, Nanolaminates, RTA, Ti AlN",

author = "Rolf Grieseler and Thomas Kups and Marcus Wilke and Marcus Hopfeld and Peter Schaaf",

year = "2012",

month = sep,

day = "1",

doi = "10.1016/j.matlet.2012.05.055",

language = "English",

volume = "82",

pages = "74--77",

journal = "Materials Letters",

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T1 - Formation of Ti 2AlN nanolaminate films by multilayer-deposition and subsequent rapid thermal annealing

AU - Grieseler, Rolf

AU - Kups, Thomas

AU - Wilke, Marcus

AU - Hopfeld, Marcus

AU - Schaaf, Peter

PY - 2012/9/1

Y1 - 2012/9/1

N2 - Multilayers consisting of titanium layers with a thickness of 4.5 nm and aluminum nitride layers with a thickness of 3 nm were deposited onto Si/Si 3N 4 substrates. Subsequently, the multilayer systems were annealed by a rapid thermal annealing process. This way, thin films of almost pure M n + 1AX n-phase Ti 2AlN could be produced, as confirmed by X-ray diffraction, glow discharge optical emission spectroscopy and high-resolution transmission electron microscopy. This procedure has a high potential for the preparation of MAX phase coatings.

AB - Multilayers consisting of titanium layers with a thickness of 4.5 nm and aluminum nitride layers with a thickness of 3 nm were deposited onto Si/Si 3N 4 substrates. Subsequently, the multilayer systems were annealed by a rapid thermal annealing process. This way, thin films of almost pure M n + 1AX n-phase Ti 2AlN could be produced, as confirmed by X-ray diffraction, glow discharge optical emission spectroscopy and high-resolution transmission electron microscopy. This procedure has a high potential for the preparation of MAX phase coatings.

KW - GDOES

KW - GIXRD

KW - HRTEM

KW - MAX-phase

KW - Multilayer coatings

KW - Nanolaminates

KW - RTA

KW - Ti AlN

UR - https://www.scopus.com/pages/publications/84863114182

U2 - 10.1016/j.matlet.2012.05.055

DO - 10.1016/j.matlet.2012.05.055

M3 - Article

AN - SCOPUS:84863114182

SN - 0167-577X

VL - 82

SP - 74

EP - 77

JO - Materials Letters

JF - Materials Letters

ER -

Formation of Ti ₂AlN nanolaminate films by multilayer-deposition and subsequent rapid thermal annealing

Abstract

Keywords

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