Concentration quenching of tb3+ doped SiC:H and AlN thin films in photoluminescence and cathodoluminescence measurements

J. A. Guerra, F. Benz, L. Montañez, R. Grieseler, P. Schaaf, F. De Zela, A. Winnacker, H. P. Strunk, R. Weingärtner

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We present a systematic study of photo- and cathodoluminescence measurements in the visible of Terbium doped SiC:H and AlN thin films. The Terbium atomic concentrations vary from 0.9 to 10% for the SiC:H and from 0.8 to 6% for the AlN samples. For both materials the increase of the emission intensity with concentration and the subsequent quenching effect can be seen. The optimal concentration for the highest light emission is found. Photoluminescence excitation spectroscopy addresses the enhancement light emission mechanisms of the principal emission electronic transition of Terbium at ∼542 nm.

Original languageEnglish
Title of host publicationLanthanide Nanomaterials for Imaging, Sensing and Optoelectronics
PublisherMaterials Research Society
Pages1-6
Number of pages6
ISBN (Print)9781632661524
DOIs
StatePublished - 2013
Event2013 MRS Spring Meeting - San Francisco, CA, United States
Duration: 1 Apr 20135 Apr 2013

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1571
ISSN (Print)0272-9172

Conference

Conference2013 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period1/04/135/04/13

Fingerprint

Dive into the research topics of 'Concentration quenching of tb3+ doped SiC:H and AlN thin films in photoluminescence and cathodoluminescence measurements'. Together they form a unique fingerprint.

Cite this